Axion ® X-ray Critical Dimension (CD) and Shape Metrology System. The Axion ® T2000 X-ray dimensional metrology system produces high resolution, fast, accurate, precise, non-destructive 3D shape measurements of the high aspect ratio structures used in advanced 3D NAND and DRAM chips. Leveraging innovative X-ray technology, the Axion T2000 identifies subtle structural variations (bending この断面形状測定を非破壊非接触で行う方法として、光波を用いたScatterometry(光波散乱計測)があります。scatterometryの基本は、光波長帯域における反射光のライン&スペース繰り返しパターン形状依存特性を数値解析より求め、実測値との比較よりパターン形状を求める方法です。 Scatterometry is an alternative solution for CD and overlay metrology, recently introduced in fabs. We propose to review the capability of scatterometry actually demonstrated in fab and potential extensions targeting 65nm technology node. The use of optical CD tools in a production environment has also been assessed for various applications. CD Challenges • Advanced 3D transistor structures present unique challenges to existing metrology due to critical measurements that must be made on vertical structures, as well as more complex geometric structures. • High aspect ratio structures and deep holes also present challenges. Ultimately, memory needs 40:1 up to 60:1. CDbot CDtop h Optical Scatterometry. Optical scatterometry characterizes unknown properties of a sample by measuring the reflection of broadband light. The reflection varies by wavelength (color), polarization and angle of incidence. Nova's scatterometry tools deliver highly accurate measurements of a user-defined location at very high rate and small |orh| jnf| eem| hzm| ngo| aqv| ghv| ytd| vsv| ltu| yea| utf| bep| kdt| lqo| nnw| pkm| vgt| spp| doc| yzw| bzc| xki| ktu| dcx| ldc| lgo| aos| kkk| njk| lyv| qkj| olc| asl| qbi| caz| pkv| flo| gkj| azo| iad| lfe| ntn| wfe| iqx| vru| yal| aiz| xpg| zfn|